Supratik Guha has been named the next director of the Nanoscience and Technology Division at the U.S. Department of Energy’s Argonne National Laboratory, as well as director of Argonne’s Center for Nanoscale Materials, a DOE Office of Science User Facility. In addition, Guha has been named a professor at the University of Chicago’s Institute for Molecular Engineering. He moves to Argonne and the University from his most recent position as the director of Physical Sciences at IBM Research. Guha received his PhD in materials science from the University of Southern California in 1991. After a postdoctoral stint at IBM in Leo Esaki’s group in 1991-92 and as a materials scientist at 3M between 1992-95, he rejoined IBM in 1995 and has been there since. He also currently holds an adjunct professorship at Columbia University. He is a fellow of the American Physical Society and the Materials Research Society. In 2013, he was awarded IBM’s highest technical award, the IBM Corporate Award, for his work on high-k metal gate technology for silicon CMOS. Earlier this year, he was elected to the National Academy of Engineering. As a researcher at IBM, Guha led the materials science work that resulted in the development of high dielectric constant oxide metal gate technology for silicon-based integrated circuits. This technology is used today by IBM and a number of its partners in mainframes, as well as by the majority of smartphones and tablets that are currently sold worldwide.